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High-vacuum magnetron sputtering sources
MAGNETRON sources from Moorfield are of modular design and geared for the R&D/pilot line user. A range of cathode sizes (2, 3 and 4inch) are available to suits customer applications and budgets. The sources are designed to be used in any orientation, are low outgassing, suitable for a wide range of operating pressures and provide excellent deposition uniformity and rates.
Document Information
Document Title | MAGNETRON |
---|---|
Document Type | Product Catalog |
File size | 717.8Kb |
Category | |
Company | Thermocera Japan Ltd. (Documents List) |
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Document Contents
Page1
MAGNETRON
High-vacuum magnetron sputtering sources
Key Features:
• High-vacuum compatible
• Accept industry-standard targets
• Water-cooled
• Variety of mounting options
• Adjustable head angle and height geometry options
• Easy removal for maintainance
• Magnetic strength/profile options
• High target yield
Overview:
MAGNETRON sources from Moorfield are of modular design
and geared for the R&D/pilot-line user. A range of cathode sizes
(2”, 3” and 4”) are available to suit customer applications and budgets. The
sources are designed to be used in any orientation, are low-outgassing,
suitable for a wide range of operating pressures and provide excellent
deposition uniformity and rates.
Configurations:
Tube mounted: The head is supported by a 3/4” OD tube, ideal for a 1” bolt
baseplate feedthrough. Vertical adjustment of the source is then possible.
Flange-mounted: The source is supplied pre-integrated with a supporting flange, ready for system
integration. Many flanges can be used, e.g., ISO100, NW100CF and
1” bolt baseplate feedthroughs.
Flexi-Head: The Flexi-Head option allows for adjustment of the
head tilt angle (in addition to vertical position). Continuous
adjustment of ±45° is possible.
Magnetic profiles: Available with balanced or unbalanced magnet
packs, of standard or high strength.
Targets: Suitable for use with 2”, 3” or 4” disc targets of industry-
standard design. High target utilisation, without any special
requirements such as keepers or thermal pastes.
Sputtering power: All MAGNETRON models are suitable for use
with RF, DC or pulsed-DC power supplies.
MOORFIELD NANOTECHNOLOGY Unit 1, Wolfe Close, Parkgate Industrial Estate, Knutsford, Cheshire, UK, WA16 8XJ
+44 (0)1565 722609 +44 (0)1565 722758 sales@moorfield.co.uk moorfield.co.uk Page 1
Moorfield Nanotechnology Limited. Registered in England and Wales with company number 3044718. Registered address: 112–114 Witton Street, Northwich, Cheshire, CW9 5NW.
Page2
MAGNETRON
Technical Specification:
Materials: Body material: Stainless steel (304).
Target clamp: Aluminium or stainless steel (304)
Bellows (for Flexi-Head): Stainless steel (316).
Electrical isolation: PEEK/PTFE.
Seals: Viton.
Magnet pack: NiFeB; epoxy encapsulation.
Cooling: 6 mm OD tube connections (e.g., for push-in fittings).
Electrical connection: N-type screw terminal.
Hardware Options:
• Chimney head fitting
• Gas injection ring
• On-board shutter
• In-vacuum head tilt gearing via rotary drive
• Cross-contamination shielding Above: Drawing for MAGNETRON (for 3” targets,
• Wide range of flange mountings: ISO100, NW100CF, with Flexi-Head option).
1” bolt baseplate feedthroughs, etc.
• Tube mountings of various sizes Distributed By:
Associated Products from Moorfield:
• Gas injection feedthroughs
• Automated/manual gas and pressure control
• Sputtering power supplies: RF, DC and pulsed-DC
• PlasmaSwitch technology: Allows controlled
routing of power between power supplies and
MAGNETRON sources, including for co-deposition
• Moorfield stainless steel chambers
• nanoPVD and MiniLab automatic/manual
magnetron sputtering systems
MOORFIELD NANOTECHNOLOGY Unit 1, Wolfe Close, Parkgate Industrial Estate, Knutsford, Cheshire, UK, WA16 8XJ
+44 (0)1565 722609 +44 (0)1565 722758 sales@moorfield.co.uk moorfield.co.uk Page 2
Moorfield Nanotechnology Limited. Registered in England and Wales with company number 3044718. Registered address: 112–114 Witton Street, Northwich, Cheshire, CW9 5NW.